发明名称 |
COPOLYMER HAVING PHENOLIC HYDROXY GROUP, AND RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin excellent in the resolution performance, sensitivity and latitude of exposure. <P>SOLUTION: The copolymer concerned is obtained by copolymerizing a monomer expressed by formula (1) (wherein, R<SP>1</SP>is a hydrogen atom or a methyl group; and R<SP>2</SP>and R<SP>3</SP>are each a saturated hydrocarbyl group) and monomers containing a monomer having a specific tertiary ether group and then by hydrolyzing with an acid perfectly an acid-dissociative group of the monomer expressed by formula (1) and besides by hydrolyzing a part of the acid-dissociative group of the monomer. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007092018(A) |
申请公布日期 |
2007.04.12 |
申请号 |
JP20060036868 |
申请日期 |
2006.02.14 |
申请人 |
JSR CORP |
发明人 |
NAGAI TOMOKI;MIZUNO HIROMI;YOSHIDA KOICHIRO;YAMAGUCHI KEIICHI;SHIMIZU DAISUKE;MATSUMURA SHINJI;NISHIYAMA SATORU;KAI TOSHIYUKI |
分类号 |
C08F8/12;C08F212/14;G03F7/039;H01L21/027 |
主分类号 |
C08F8/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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