发明名称 COPOLYMER HAVING PHENOLIC HYDROXY GROUP, AND RADIATION-SENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin excellent in the resolution performance, sensitivity and latitude of exposure. <P>SOLUTION: The copolymer concerned is obtained by copolymerizing a monomer expressed by formula (1) (wherein, R<SP>1</SP>is a hydrogen atom or a methyl group; and R<SP>2</SP>and R<SP>3</SP>are each a saturated hydrocarbyl group) and monomers containing a monomer having a specific tertiary ether group and then by hydrolyzing with an acid perfectly an acid-dissociative group of the monomer expressed by formula (1) and besides by hydrolyzing a part of the acid-dissociative group of the monomer. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007092018(A) 申请公布日期 2007.04.12
申请号 JP20060036868 申请日期 2006.02.14
申请人 JSR CORP 发明人 NAGAI TOMOKI;MIZUNO HIROMI;YOSHIDA KOICHIRO;YAMAGUCHI KEIICHI;SHIMIZU DAISUKE;MATSUMURA SHINJI;NISHIYAMA SATORU;KAI TOSHIYUKI
分类号 C08F8/12;C08F212/14;G03F7/039;H01L21/027 主分类号 C08F8/12
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