发明名称 SUBSTRATE TESTING APPARATUS AND SUBSTRATE TESTING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate testing apparatus and a substrate testing method for testing whether the mesa direction is adequate direction to the standard linear line within a short period of time with non-destructive system. SOLUTION: The substrate testing apparatus 10 comprises: an LED sensor 2 for detecting location of an orientation flat OF provided at the edge of a compound semiconductor substrate W having an arc type edge E; an imaging unit 4 for imaging a plurality of patterns P formed by the etching on the front surface S of the compound semiconductor substrate W; and an analyzing unit 6 for determining the mesa direction Dm using an image obtained from the imaging unit 4, and computing an angleθformed with the standard linear line L connecting the center O of the compound semiconductor substrate W and location A of the orientation flat OF and the determined mesa direction Dm. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007095816(A) 申请公布日期 2007.04.12
申请号 JP20050280440 申请日期 2005.09.27
申请人 SUMITOMO ELECTRIC IND LTD 发明人 NISHIURA TAKAYUKI;YAGO AKIHIRO
分类号 H01L21/66;G01N21/956 主分类号 H01L21/66
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