发明名称 ELECTRODE STRUCTURE PRODUCTION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for preventing an Al electrode film surface from being oxidized in forming an Au film by applying an Au paste onto an Al electrode film in the air. <P>SOLUTION: This method forms an Al electrode film 12 on a semiconductor substrate 10, removes an oxide film 30 from the corresponding surface by performing plasma treatment on the surface of the Al electrode film 12 in a mixed gas atmosphere of CF<SB>4</SB>gas and nitrogen gas, and forms an oxidation resistant film 40 which is composed of compounds of Al and F and removed from the corresponding surface in burning a paste 50. Then, this method applies the paste 50 onto the oxidation resistant film 40, and burns the paste 50 to form an Au film 14. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007096231(A) 申请公布日期 2007.04.12
申请号 JP20050287046 申请日期 2005.09.30
申请人 DENSO CORP 发明人 NINOMIYA YASUTOKU;TOTOKAWA SHINJI;TOMISAKA MANABU
分类号 H01L21/60;H01L21/3205;H01L23/52 主分类号 H01L21/60
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