| 摘要 |
PROBLEM TO BE SOLVED: To accurately perform focus control by making the variable voltage of an electrostatic lens extremely small, in regard to a charged particle beam device requiring accurate and speedy focus control, especially one performing observation and inspection of the surfaces of a semiconductor wafer and a photo mask, and its focus control method. SOLUTION: The charged particle beam device is equipped with the electrostatic lens disposed in the lens magnetic field of a magnetic field type objective lens, and a focus control means to perform focus control by applying a voltage on an electrode forming the electrostatic lens, weakening or strengthening lens action by the magnetic field type lens by accelerating or decelerating the charged particle beam passing through the magnetic field of the magnetic field type objective lens, and focusing the charged particle beam by the electrostatic lens. COPYRIGHT: (C)2007,JPO&INPIT
|
