发明名称 |
Method of forming micro-patterns using multiple photolithography process |
摘要 |
Provided is a method of forming micro-patterns using a multi-photolithography process, including: providing an etch target layer where micro-patterns are to be formed; forming a mask layer on the etch target layer; forming a first mask pattern including engraved portions and embossed portions by etching a predetermined region of the mask layer; forming a final mask pattern in the first mask pattern by etching a predetermined region of the residual embossed portions of the mask layer; and forming micro-patterns by etching the etch target layer using the final mask pattern as an etch mask.
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申请公布号 |
US2007082296(A1) |
申请公布日期 |
2007.04.12 |
申请号 |
US20060545417 |
申请日期 |
2006.10.10 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YANG SONG-YI;CHI KYEONG-KOO |
分类号 |
G03C5/00 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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