| 摘要 |
This invention provides a method for preparing surface concaves and convexes that can easily form a desired concave-convex shape with high accuracy using a photomask. A mask member having a light permeable part and a light impermeable part is disposed on one side of a photosensitive film formed of a photosensitive resin composition while providing a space between the photosensitive film and the mask member. Light is applied from a light source disposed on the mask member side to expose the photosensitive film through the light permeable part in the mask member. The exposed part or the unexposed part in the photosensitive film is removed by development to prepare concaves and convexes determined by the shape of the exposed part or the unexposed part in the photosensitive film. In the exposure, exposure conditions such as the distance (L) between the light source and the light shielding face of the mask member, the size (D) of the light source, and the optical distance (T) between the mask member and the photosensitive film are regulated to regulate the shape of the exposed part or the unexposed part. |
