发明名称 METHOD OF MAKING AN INTEGRATED CIRCUIT
摘要 A method is provided for making an integrated circuit (IC). Cell (200) representing a layout of a set of features, is divided into at least a first region (250) and a second region (240). Optical Proximity Correction (OPC) is carried out on at least the first region of cell (200). One or more instances of cell (200) are located to define IC prior to carrying out final OPC optimisation on the second regions (240) of each cell (200) in the defined IC.
申请公布号 WO2007038972(A1) 申请公布日期 2007.04.12
申请号 WO2005EP11643 申请日期 2005.09.20
申请人 FREESCALE SEMICONDUCTOR, INC.;LUCAS, KEVIN, D,;BOONE, ROBERT, E,;WIMMER, KARL,;PATTERSON, KYLE, 发明人 LUCAS, KEVIN, D,;BOONE, ROBERT, E,;WIMMER, KARL,;PATTERSON, KYLE,
分类号 G03F1/00;G03F1/36 主分类号 G03F1/00
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