| 摘要 |
The fabrication of a MEMS device such as an interferometric modulator is improved by employing an etch stop layer (44) between a sacrificial layer (46) and a mirror layer (38). The etch stop may reduce undesirable over-etching of the sacrificial layer and the mirror layer. The etch stop layer may also serve as a barrier layer, buffer layer, and/or template layer. |
