发明名称 Chemical amplification type positive resist composition
摘要 A chemical amplification type positive resist composition, which can reduce cost steeply without significantly decreasing basic abilities, is provided, and the chemical amplification type positive resist composition includes (A) a resin having a polymerization unit derived from p-hydroxystyrene and a polymerization unit of the formula (1) or formula (2)
申请公布号 US7202010(B2) 申请公布日期 2007.04.10
申请号 US20020254598 申请日期 2002.09.26
申请人 SUMITOMO CHEMICAL COMPANY LIMITED 发明人 YAMADA AIRI;SUETSUGU MASUMI;UETANI YASUNORI
分类号 G03F7/039;C08F212/14;C08F220/18;G03F7/004;H01L21/027 主分类号 G03F7/039
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