发明名称 |
Chemical amplification type positive resist composition |
摘要 |
A chemical amplification type positive resist composition, which can reduce cost steeply without significantly decreasing basic abilities, is provided, and the chemical amplification type positive resist composition includes (A) a resin having a polymerization unit derived from p-hydroxystyrene and a polymerization unit of the formula (1) or formula (2)
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申请公布号 |
US7202010(B2) |
申请公布日期 |
2007.04.10 |
申请号 |
US20020254598 |
申请日期 |
2002.09.26 |
申请人 |
SUMITOMO CHEMICAL COMPANY LIMITED |
发明人 |
YAMADA AIRI;SUETSUGU MASUMI;UETANI YASUNORI |
分类号 |
G03F7/039;C08F212/14;C08F220/18;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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