发明名称 Treatment condition decision method, treatment condition decision system, treatment system, treatment condition decision calculator program, program recording medium, and semiconductor device manufacturing method
摘要 In step S 11 , quantities that are varied (parameters) are respectively varied in a stepwise manner at a specified pitch, and standard working conditions consisting of combinations of these parameters are determined. For all of the standard working conditions, a working is actually performed, and the treated shapes that are obtained as a result are taken as the standard treated shapes for the respective standard working conditions (step S 12 ). In cases where an appropriate simulation program is available, the standard treated shapes may be determined by simulation without actually performing a working. The standard working conditions and standard treated shapes thus determined are stored in a memory device. When the desired shape that is to be obtained by working is given in step S 13 , a standard treated shape that is close to the desired shape is sought in step S 14 . Thus, when a treated shape is given, the working conditions for this treated shape can be determined.
申请公布号 US7203564(B2) 申请公布日期 2007.04.10
申请号 US20040924201 申请日期 2004.08.24
申请人 NIKON CORPORATION 发明人 SENGA TATSUYA;USHIO YOSHIJIRO
分类号 G06F19/00;B24B37/04;B24B49/00;H01L21/3105;H01L21/321;H01L21/768 主分类号 G06F19/00
代理机构 代理人
主权项
地址