发明名称 Very high-aperture projection objective
摘要 A very high-aperture, purely refractive projection objective having a multiplicity of optical elements has a system diaphragm ( 5 ) arranged at a spacing in front of the image plane. The optical element next to the image plane ( 3 ) of the projection objective is a planoconvex lens ( 34 ) having a substantially spherical entrance surface and a substantially flat exit surface. The planoconvex lens has a diameter that is at least 50% of the diaphragm diameter of the system diaphragm ( 5 ). It is preferred to arrange only positive lenses ( 32, 33, 34 ) between the system diaphragm ( 5 ) and image plane ( 3 ). The optical system permits imaging in the case of very high apertures of NA>=0.85, if appropriate of NA>=1.
申请公布号 US7203008(B2) 申请公布日期 2007.04.10
申请号 US20040935321 申请日期 2004.09.08
申请人 CARL ZEISS SMT AG 发明人 SCHUSTER KARL-HEINZ
分类号 G02B9/00;G02B13/24;G02B13/14;G02B13/18;G03F7/20;H01L21/027 主分类号 G02B9/00
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