发明名称 III-V and II-VI compounds as template materials for growing germanium containing film on silicon
摘要 An assembly comprising a semiconductor substrate having a first lattice constant, an intermediate layer having a second lattice constant formed on the semiconductor substrate, and a virtual substrate layer having a third lattice constant formed on the intermediate layer. The intermediate layer comprises one of a combination of III-V elements and a combination of II-VI elements. The second lattice constant has a value that is approximately between the values of the first lattice constant and the third lattice constant.
申请公布号 US7202503(B2) 申请公布日期 2007.04.10
申请号 US20040883295 申请日期 2004.06.30
申请人 INTEL CORPORATION 发明人 CHOW LOREN;SHAHEEN MOHAMAD
分类号 H01L29/22;H01L29/06;H01L31/0328 主分类号 H01L29/22
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