发明名称 Projection exposure machine comprising a projection lens
摘要 A projection exposure machine comprises a projection lens with a lens arrangement and at least one stop. The lens arrangement comprises a group of optical elements which is arranged between the stop and the image plane. An optical element of the group situated close to the image plane has a thickness of at least 6.5% of the entire stop diameter.
申请公布号 US7203007(B2) 申请公布日期 2007.04.10
申请号 US20040915972 申请日期 2004.08.11
申请人 CARL ZEISS SMT AG 发明人 SCHUSTER KARL-HEINZ
分类号 G02B9/00;G02B3/08;G02B3/14;G02B13/14;G02B13/18;G02B17/08;G03B27/54;G03F7/20 主分类号 G02B9/00
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