Method of forming tungsten layer having low resistance,申请号KR20050063063-传众专利搜索

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发明名称	Method of forming tungsten layer having low resistance
摘要
申请公布号	KR100705397(B1)	申请公布日期	2007.04.10
申请号	KR20050063063	申请日期	2005.07.13
申请人		发明人
分类号	H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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