METHOD AND APPARATUS FOR AN IMPROVED DEPOSITION SHIELD IN A PLASMA PROCESSING SYSTEM,申请号KR20057005435-传众专利搜索

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发明名称	METHOD AND APPARATUS FOR AN IMPROVED DEPOSITION SHIELD IN A PLASMA PROCESSING SYSTEM
摘要
申请公布号	KR100704069(B1)	申请公布日期	2007.04.06
申请号	KR20057005435	申请日期	2005.03.29
申请人		发明人
分类号	H01L21/205;H01J37/32;H01L21/306;H01L21/3065;H05H1/00	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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