发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
摘要 <p>A nonvolatile semiconductor memory device includes a gate electrode provided on a channel region of a semiconductor layer and a floating gate provided on a back side of the semiconductor layer with a first insulating layer interposed therebetween.</p>
申请公布号 KR20070037677(A) 申请公布日期 2007.04.06
申请号 KR20060092236 申请日期 2006.09.22
申请人 SEIKO EPSON CORPORATION 发明人 KATO JURI
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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