Thermal spray coating

摘要

A thermal spray coating includes yttrium oxide at least as a main component. When the thermal spray coating is exposed to CF₄ plasma and the plasma power of the CF₄ plasma per unit area applied onto the thermal spray coating is 0.8 W/cm² or greater, an etching rate by the CF₄ plasma of the thermal spray coating satisfies the equation Re<=7.7xPP^2.2. Alternatively, when the plasma power of the CF₄ plasma per unit area applied onto the thermal spray coating is less than 0.8 W/cm², an etching rate by the CF₄ plasma of the thermal spray coating satisfies the equation Re<=8.0xPP^2.2. In the equations, "Re", represents the etching rate (nm/minute) by the CF₄ plasma of the thermal spray coating, and "Pp" represents the plasma power per unit area (W/cm²) applied onto the thermal spray coating.