发明名称 |
Lithographic apparatus temperature compensation |
摘要 |
A lithographic apparatus includes a position measurement system to determine along a measurement path a position of a first part of the lithographic apparatus with respect to a position of a second part of the lithographic apparatus. The position determination system comprises a plurality of temperature sensors to measure a temperature of a medium along the measurement path. The position measurement system corrects the determined position making use of the temperature as measured by the temperature sensors.
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申请公布号 |
US2007076218(A1) |
申请公布日期 |
2007.04.05 |
申请号 |
US20050242130 |
申请日期 |
2005.10.04 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN EMPEL TJARKO A.R.;BEEMS MARCEL H.M.;EUSSEN EMIEL J.M. |
分类号 |
G01B11/02 |
主分类号 |
G01B11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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