| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion exposure device washing method that makes it possible to easily wash the projection lens of an immersion exposure device. <P>SOLUTION: This method has been devised to wash an immersion exposure device 1 which has a projection lens 4 above a semiconductor substrate 2, and contains an immersion liquid 5 between the semiconductor substrate 2 and the projection lens 4. The semiconductor substrate 2 with a cleaning agent 12 applied is covered with the immersion liquid 5, and then the projection lens 4 is run on that semiconductor 2. In this way, the cleaning agent 12 is resolved into the immersion liquid 5, so that the immersion exposure device 1 can be washed without removing the projection lens 4. <P>COPYRIGHT: (C)2007,JPO&INPIT |
