发明名称 |
METHOD FOR THERMAL DEVELOPMENT OF PHOTOSENSITIVE ELEMENT USING DEVELOPMENT MEDIUM HAVING SUPPORT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for thermally developing a photosensitive element to form a relief pattern. <P>SOLUTION: The method includes a step of heating a composition layer of the photosensitive element to cause a portion of the composition layer to liquefy, and a step of providing a development medium under tension to the photosensitive element to absorb the liquefied composition. The development medium includes an absorbent material and a support, the combination of which minimizes stretch and distortion of the absorbent material and can impede the migration of the liquefied composition through the absorbent material. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007086781(A) |
申请公布日期 |
2007.04.05 |
申请号 |
JP20060251511 |
申请日期 |
2006.09.15 |
申请人 |
E I DU PONT DE NEMOURS & CO |
发明人 |
DUDEK DIETMAR;HACKLER MARK A;MCMILLEN ROBERT A;BANKE ALLAN |
分类号 |
G03F7/34;B41C1/055;B41N1/12;G03F7/00;G03F7/004 |
主分类号 |
G03F7/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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