发明名称 MEASURING APPARATUS AND METHOD OF SURFACE PLASMON RESONANCE
摘要 PROBLEM TO BE SOLVED: To provide a measuring apparatus of surface plasmon resonance capable of measuring surface plasmon resonance while specifying the accurate occurring position thereof, capable of knowing the correlation of the fine structure of localized surface plasmon with the surface structure of a sample and simple in its structure and low in cost, and a measuring method of the surface plasmon resonance. SOLUTION: Light is thrown on the back of the surface to be measured of the sample 1 such as a metal thin film or the like under a total reflection condition from an exciting light source 6 and the reflected light from the back of the surface to be measured is detected by a detector 7. When surface plasmon is subjected to resonance excitation by regulating the incident angle or wavelength of the incident light, the intensity of the reflected light becomes minimum and an enhanced evanescent wave 9 is generated by the absorption of the incident light. A probe 21 is brought into contact with the enhanced evanescent wave 9 to detect reflected light modulated by this contact and the surface plasmon resonance at the contact position is measured on the basis of the position dissolving power corresponding to the diameter of the probe. The surface to be measured is scanned by an atomic force microscope to efficiently and accurately know the correlation of the fine structure of surface plasmon with the surface structure of the sample. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007085744(A) 申请公布日期 2007.04.05
申请号 JP20050271378 申请日期 2005.09.20
申请人 SONY CORP 发明人 HARADA TOMOKO
分类号 G01N21/27 主分类号 G01N21/27
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