| 摘要 |
A film formation system 10 includes a processing chamber 15 bounded by sidewalls 18 and a top cover 11 . In one embodiment, a susceptor 16 is rotatably disposed in the system 10 , and overlaps with a first peripheral member 205 disposed around the sidewalls 18 . A radiant heating system 313 is disposed under the susceptor 305 to heat the substrate 19 . In another embodiment, the top cover 11 has equally spaced pyrometers 58 for measuring the temperature of the substrate 19 across a number of zones. The temperature of the substrate 19 is obtained from pyrometric data from the pyrometers 58.
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