| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method by which a permanent pattern such as a wiring pattern can be efficiently formed with high definition, by forming a desired drawn pattern with few jags on a surface of a photosensitive layer to be exposed, using a pattern forming material excellent in followup ability to irregularity, without reducing exposure speed, in a pattern forming method in which exposure is performed for drawing by inclining a light modulating means. <P>SOLUTION: The pattern forming method includes exposing a photosensitive layer in a pattern forming material having a cushion layer and the photosensitive layer in this order, wherein at least one of array pitch (a), tilt angle (b), drawing pitch (c) and phase difference (d) of drawn pixels is set so that at least one of jag pitch and jag amplitude of jags produced by reproduction with drawn pixels formed by imaging sections becomes a predetermined value or less, and the exposure is performed under modulation control of the imaging sections based on pattern information at predetermined timing. <P>COPYRIGHT: (C)2007,JPO&INPIT |
