发明名称 MULTILAYER REFLECTOR AND EUV EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a multilayer reflector capable of absorbing an exciting light before arrival thereat which is not needed for the exposure, and causes the reflector forming a projection optical system to be thermally expanded. <P>SOLUTION: An exposing light reflective film 2 is formed on a quartz board 1 with an exciting light antireflective film 3 formed thereon. The exciting light having a long wavelength is absorbed by an exciting light antireflective part laid on the front side to reduce the exciting light reflection low, while the exposing light having a short wavelength transmits through the exciting light antireflective part to arrive at an exciting light reflective part to reflect it. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007088237(A) 申请公布日期 2007.04.05
申请号 JP20050275585 申请日期 2005.09.22
申请人 NIKON CORP 发明人 KOMIYA TAKEHARU;KONDO HIROYUKI
分类号 H01L21/027;G03F7/20;H05G2/00 主分类号 H01L21/027
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