发明名称 |
Stabilizer-Fenton's reaction metal-vinyl pyridine polymer-surface-modified chemical mechanical planarization composition and associated method |
摘要 |
A composition and an associated method for chemical mechanical planarization (or other polishing) are described. The composition includes a stabilizer-metal-vinyl pyridine polymer surface-modified colloidal abrasive (e.g., silica) and an oxidizing agent (e.g., hydrogen peroxide), where the metal is a Fenton's reaction metal. The method includes applying the composition to a substrate to be polished (e.g., chemical-mechanical polishing (CMP)), such as substrates containing tungsten or copper and dielectrics layers that being subjected to tungsten or copper CMP for planarization.
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申请公布号 |
US2007075042(A1) |
申请公布日期 |
2007.04.05 |
申请号 |
US20060516002 |
申请日期 |
2006.09.05 |
申请人 |
SIDDIQUI JUNAID A;COMPTON TIMOTHY F;CASTILLO DANIEL H II;HU BIN |
发明人 |
SIDDIQUI JUNAID A.;COMPTON TIMOTHY F.;CASTILLO DANIEL H.II;HU BIN |
分类号 |
C09K13/00;B44C1/22;C03C15/00;C23F1/00;H01L21/302 |
主分类号 |
C09K13/00 |
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