ANTIREFLECTIVE HARD MASK COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a new composition and a new method for manufacturing an integrated circuit.

SOLUTION: The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.

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