| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a film forming apparatus and a film forming method that can easily control the film thickness in a film forming process. <P>SOLUTION: The film forming apparatus is constituted so that a film forming chamber 10 for forming a film is communicated with a measuring chamber 20 for measuring a thickness of the film, and respective internal pressures can be controlled. In such constitution, in a state in which the film forming chamber 10 and the measuring chamber 20 are evacuated, a substrate B moved between both chambers 10, 20, and both the film formation and the measurement can be repeated. Further, while the film is formed, the interruption between the film forming chamber 10 and the measuring chamber 20 is made. Accordingly, inside of the measuring chamber is maintained clean without being polluted with the aerosol, and the measurement precision can be maintained. Thus, in the film forming process, the film thickness can be easily and precisely measured to be fed back to the film forming condition. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
