发明名称 NEW ORGANOMETALLIC PRECURSOR SUBSTANCE AND METHOD FOR PRODUCING METALLIC THIN FILM UTILIZING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a new organometallic precursor substance easily splittable even without the reaction with any oxidizing agent, and to provide a method for producing metallic thin film utilizing the same. SOLUTION: The new organometallic precursor substance has such a structure that either one series substance, as an organic molecule having an unshared electron pair, selected from the group consisting of ethers, amines, THF, phosphine series and phosphite salt series is coordinate-bonded to Ru(DMPD)<SB>2</SB>or Ir(DMPD)<SB>2</SB>. [DMPD:dimethylpentadienyl]. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007084529(A) 申请公布日期 2007.04.05
申请号 JP20060212288 申请日期 2006.08.03
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 RI SHOKEN;JO HANSHAKU
分类号 C07F15/00;C23C16/18;H01L21/285 主分类号 C07F15/00
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