发明名称 |
IMPROVED CHAMBER FOR A MICROELECTROMECHANICAL DEVICE |
摘要 |
A method for forming an improved chamber for a micro-electromechanical device includes depositing a sacrificial layer on a substrate; depositing a masking layer on a surface of the sacrificial layer; removing at least one predetermined portion of the masking layer down to the sacrificial layer to form an etch pattern; isotropically etching the etch pattern into the sacrificial layer to a partial depth thereof and partially undercutting a remaining portion of the mask material; anisotropically etching the etch pattern into the sacrificial layer to the substrate to form a recessed pattern in the sacrificial layer with at least one anchor region on the substrate surrounding at least one plateau of sacrificial layer; depositing a structural layer over the at least one plateau and filling the recessed pattern; providing an access port to the sacrificial layer; and removing the remaining sacrificial layer.
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申请公布号 |
WO2007018875(A8) |
申请公布日期 |
2007.04.05 |
申请号 |
WO2006US26520 |
申请日期 |
2006.07.10 |
申请人 |
EASTMAN KODAK COMPANY;DEBAR, MICHAEL JAMES |
发明人 |
DEBAR, MICHAEL JAMES |
分类号 |
B81C1/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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