| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to measure a constantly right substrate temperature without adjusting the focal position of a noncontact radiation thermometer even if a substrate processing position changes depending on a substrate processing condition. SOLUTION: The apparatus has a reaction chamber 20 for processing a substrate, a plate-heater 5 prepared in the reaction chamber 20 to hold the substrate and having a primary heater for heating the substrate from its reverse side, a secondary heater prepared outside the reaction chamber 20 to heat the substrate from its front side, a plate heater transportation device for transporting the plate heater 5 in the reaction chamber 20, a noncontact radiation thermometer 40 for measuring the temperature of the substrate in a noncontact way, a thermometer transportation device for transporting the noncontact radiation thermometer 40 such that the distance between the substrate placed on the plate heater 5 and the noncontact radiation thermometer 40 is kept to be constant, and a control device 80 for adjusting electric power supplied to the primary and secondary heaters according to measurement signals of the noncontact radiation thermometer 40 to control the temperature of the substrate. COPYRIGHT: (C)2007,JPO&INPIT
|
