发明名称 HIGH PRESSURE PROCESSOR AND HIGH PRESSURE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To suppress concentration fluctuation of chemical immediately after an injection valve is opened and to stabilize a surface processing in a device and a method for opening the injection valve, injecting chemical to high pressure fluid, obtaining processing fluid and performing the prescribed surface processing on a surface of a workpiece by using processing fluid. SOLUTION: High pressure fluid pressure in high pressure piping 26 in a branch position BP is detected by an SCF-side pressure gauge 27 and chemical pressure in a chemical line is detected by a chemical-side pressure gauge 36. It is confirmed that a chemical pressure value becomes a high pressure fluid pressure value P1 or above, the injection valve 34 is opened and chemical is injected to high pressure fluid. Consequently, a counterflow phenomenon that high pressure flows into the chemical line from high pressure piping 26 through the injection valve 34 just after the injection valve 34 is opened is securely prevented, and concentration fluctuation of chemical in the chemical line is effectively prevented. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007087986(A) 申请公布日期 2007.04.05
申请号 JP20050271326 申请日期 2005.09.20
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SAITO KIMITSUGU
分类号 H01L21/304;B08B3/04;H01L21/027 主分类号 H01L21/304
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