发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT BOARD USING SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide: a photosensitive polyimide resin composition containing no acid generator and capable of performing heat treatment at a lowered temperature, which is difficult in the case of a conventional polyimide resin; an alkali developable photosensitive cover lay; and a circuit board using the same. <P>SOLUTION: The photosensitive resin composition developable with an alkaline aqueous solution contains a soluble polyimide having a carboxyl group in a molecule and a photobase generator capable of generating an amino group upon photoirradiation. The circuit board has the photosensitive cover lay using the photosensitive resin composition. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007086763(A) 申请公布日期 2007.04.05
申请号 JP20060226864 申请日期 2006.08.23
申请人 ASAHI KASEI CORP 发明人 NAGASAWA TOSHIAKI;TAKAHASHI HIDEAKI
分类号 G03F7/038;C08G73/10;G03F7/004;G03F7/031;H05K1/03;H05K3/28 主分类号 G03F7/038
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