发明名称 Method for forming a pattern and liquid ejection apparatus
摘要 A laser head is provided in the vicinity of an ejection head. A laser beam radiated by the laser head reaches a substrate reflecting position on a surface of the substrate at a critical angle and is then totally reflected by the substrate toward the ejection head. After having been reflected by the substrate, the laser beam is totally reflected by a reflective surface of a nozzle plate toward the substrate. The laser beam thus reaches a radiating position on the surface of the substrate at a radiating angle (the critical angle).
申请公布号 US2007076077(A1) 申请公布日期 2007.04.05
申请号 US20060541939 申请日期 2006.10.02
申请人 SEIKO EPSON CORPORATION 发明人 MIURA HIROTSUNA
分类号 B41J2/01;B23K26/00 主分类号 B41J2/01
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