| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for efficiently recovering indium hydroxide or indium from a scrap containing high purity indium oxide generated at the manufacturing or after use of ITO sputtering target. <P>SOLUTION: This method for recovering indium hydroxide comprises the steps of adding an aqueous solution of sodium hydroxide or ammonium hydroxide to fine indium hydroxide or a solution containing ionic indium to adjust pH to 7 to 10 to coagulate indium hydroxide, and filtering the indium hydroxide. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
