| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam exposure apparatus in which occurrence of beam drift can be prevented while preventing occurrence of contamination in the electron beam exposure apparatus, and to provide a method of cleaning it. SOLUTION: The electron beam exposure apparatus for exposing a desired pattern on a sample mounted on a wafer stage 124 with an electron beam generated from an electron gun 101 comprises a means 129 for injecting reducing gas into a column 100 containing the electron gun 101 and the wafer stage 124, and a control means 209 for sustaining injection of reducing gas into the column 100 for a predetermined time. A means 128 for injecting ozone gas into the column 100 is also provided and the control means 209 sustains injection of ozone gas into the column 100 for a predetermined time in addition to injection of reducing gas. COPYRIGHT: (C)2007,JPO&INPIT
|
