发明名称 High performance device design
摘要 A semiconductor structure having a recessed active region and a method for forming the same are provided. The semiconductor structure comprises a first and a second isolation structure having an active region therebetween. The first and second isolation structures have sidewalls with a tilt angle of substantially less than 90 degrees. The active region is recessed. By recessing the active region, the channel width is increased and device drive current is improved.
申请公布号 US2007075377(A1) 申请公布日期 2007.04.05
申请号 US20050243959 申请日期 2005.10.05
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 HUANG CHIEN-CHAO;YANG FU-LIANG
分类号 H01L29/76 主分类号 H01L29/76
代理机构 代理人
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