发明名称 HIGH-FREQUENCY POWER SOURCE DEVICE AND METHOD FOR CONTROLLING HIGH-FREQUENCY POWER SOURCE
摘要 <P>PROBLEM TO BE SOLVED: To dissolve the problem of plasma disappearance arose in a region where the absolute value ¾&Gamma;¾ of a reflection coefficient is large, or hunting arose in a matching process in a high-frequency power source, both arose in the case when a load side power constant control ( PL control) is carried out, and to dissolve the problem of a plasma disappearance arose in a region where the absolute value ¾&Gamma;¾ of a reflection coefficient is small, or a hunting that generates in a matchig process in a high-frequency power source, both arose in the case when a progressive wave power constant control ( PF control) is carried out. <P>SOLUTION: The PL control is carried out when the reflective coefficient operated in a reflective coefficient operation part 22 is entered in one of the inside region of a plurality of inside regions settled in a region setting part 23, and the PF control is carried out when the reflective coefficient above is went out from one of the outside region of a plurality of outside regions. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007087908(A) 申请公布日期 2007.04.05
申请号 JP20050278780 申请日期 2005.09.26
申请人 DAIHEN CORP 发明人 OOICHI HIROAKI;KAWABE YOSHIAKI;ITO HIDEO
分类号 H05H1/46;H03G3/30 主分类号 H05H1/46
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