发明名称 Schottky barrier diode and method thereof
摘要 Pt/n<SUP>-</SUP>GaN Schottky barrier diodes are disclosed that are particularly suited to serve as ultra-violet sensors operating at wavelengths below 200 nm. The Pt/n<SUP>-</SUP>GaN Schottky barrier diodes have very large active areas, up to 1 cm<SUP>2</SUP>, which exhibit extremely low leakage current at low reverse biases. Very large area Pt/n<SUP>-</SUP>GaN Schottky diodes of sizes 0.25 cm<SUP>2 </SUP>and 1 cm<SUP>2 </SUP>have been fabricated from n<SUP>-</SUP>/n<SUP>+</SUP>GaN epitaxial layers grown by vapor phase epitaxy on single crystal c-plane sapphire, which showed leakage currents of 14 pA and 2.7 nA, respectively for the 0.25cm<SUP>2 </SUP>and 1 cm<SUP>2 </SUP>diodes both configured at a 0.5V reverse bias.
申请公布号 US2007075391(A1) 申请公布日期 2007.04.05
申请号 US20050251531 申请日期 2005.09.30
申请人 ASLAM SHAHID;FRANZ DAVID 发明人 ASLAM SHAHID;FRANZ DAVID
分类号 H01L27/095 主分类号 H01L27/095
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