发明名称 METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
摘要 A method of fabricating a HI-nitride power semiconductor device that includes growing a transition layer over a substrate using at least two distinct and different growth methods.
申请公布号 US2007077714(A1) 申请公布日期 2007.04.05
申请号 US20060534855 申请日期 2006.09.25
申请人 INTERNATIONAL RECTIFIER CORPORATION 发明人 BEACH ROBERT;BRIDGER PAUL;BRIERE MICHAEL A.
分类号 H01L21/20 主分类号 H01L21/20
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