PHOTOMASK BLANK AND PROCESS FOR PRODUCING THE SAME, PROCESS FOR PRODUCING PHOTOMASK, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE

摘要

This invention provides a photomask blank, which has good flatness in the patterning of a light shielding film and thus can provide a good mask pattern accuracy and a pattern transfer accuracy, and a process for producing a photomask. In a photomask blank comprising a light shielding film containing at least chromium on a light transparent substrate, while making an allowance for a film stress change of the light shielding film by heat treatment according to a resist film formed on the light shielding film, a light shielding film, which causes a desired film stress in a direction opposite to the film stress change, is formed. A photomask is produced by patterning the light shielding film in the photomask blank by dry etching treatment.