发明名称 SUBSTRATE TABLE, PRODUCTION METHOD THEREFOR AND PLASMA TREATING DEVICE
摘要 The susceptor of a plasma treating device, or the electrostatic chuck of a substrate table, is formed by ceramic thermal spray method. A thermally sprayed ceramic layer is pore-sealed by methacrylic resin. Resin raw material mainly containing methyl methacrylate is applied to and impregnated into the thermally sprayed ceramic layer and then is cured to thereby fill pores between ceramic particles in the thermally sprayed ceramic layer with methacrylic resin. Methacrylic resin raw material solution, which does not produce pores at curing, can complete perfect pore sealing.
申请公布号 KR20070037516(A) 申请公布日期 2007.04.04
申请号 KR20077006051 申请日期 2007.03.15
申请人 TOKYO ELECTRON LIMITED 发明人 MUTO SHINJI;TAGUCHI CHIHIRO;OKAYAMA NOBUYUKI
分类号 H01L21/683;C23C4/02;C23C4/18;C23C28/00;H01L21/687 主分类号 H01L21/683
代理机构 代理人
主权项
地址