发明名称 METHOD OF DETERMINING THE CORRECT AVERAGE BIAS COMPENSATION VOLTAGE DURING A PLASMA PROCESS
摘要 <p>A method for removing a substrate that is attached to a bipolar electrostatic chuck (ESC) by application of a bipolar ESC voltage is provided which includes discontinuing the bipolar ESC voltage after processing a current substrate, and determining a monopolar component error of the processing. The method also includes correcting the monopolar component error for a subsequent substrate.</p>
申请公布号 KR20070037452(A) 申请公布日期 2007.04.04
申请号 KR20067027764 申请日期 2005.06.28
申请人 LAM RESEARCH CORPORATION 发明人 HOWALD ARTHUR M.
分类号 H01L21/683;H01L21/687;H02H1/00 主分类号 H01L21/683
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