发明名称 |
Under-bump metallization layers and electroplated solder bumping technology for flip-chip |
摘要 |
A series of improved processes and methods to manufacture solder bumps on the wafer which shrink the space among solder bumps and reduce the cost of manufacturing. A design method and a relevant manufacturing process are introduced to form an organic material or metal material layer, which is called a Bump-Reflow-Control Layer. The pad patterns can be defined by this method. A mechanical part is designed with a hermetic cover to improve the photoresist process. The series of photolithography process including the designing method of related photolithography mask is introduced to achieve the high quality and thick photoresist.
|
申请公布号 |
US7199036(B2) |
申请公布日期 |
2007.04.03 |
申请号 |
US20040854174 |
申请日期 |
2004.05.27 |
申请人 |
THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY |
发明人 |
CHAN CHINGHO PHILIP;XIAO GUOWEI DAVID |
分类号 |
H01L21/44;C25D7/12;H01L21/60;H01L23/02;H01L23/485 |
主分类号 |
H01L21/44 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|