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发明名称
RESIST MATERIAL FOR LIQUID IMMERSION EXPOSURE PROCESS AND METHOD OF FORMING RESIST PATTERN WITH THE RESIST MATERIAL
摘要
申请公布号
KR100702730(B1)
申请公布日期
2007.04.03
申请号
KR20057016236
申请日期
2005.08.31
申请人
发明人
分类号
G03F7/004;G03F7/038;G03F7/20;H01L21/027
主分类号
G03F7/004
代理机构
代理人
主权项
地址
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