发明名称 MOSFET having Mott pattern
摘要 <p>An MOSFET(Metal Oxide Semiconductor Field Effect Transistor) is provided to restrain remarkably a subthreshold swing by using a moat pattern containing an MIT(Metal-Insulator Transition) material. An MOSFET includes a first electrode(15) on a substrate(11), a second electrode(16) spaced apart from the first electrode, a channel region between the first and the second electrodes, an insulated gate electrode, and a moat pattern. The insulated gate electrode(19) faces the channel region. The moat pattern(17) is arranged between the channel region and the second electrode. The moat pattern contains an MIT material. The first and the second electrodes are source and drain, respectively.</p>
申请公布号 KR100702033(B1) 申请公布日期 2007.03.30
申请号 KR20060037310 申请日期 2006.04.25
申请人 发明人
分类号 H01L21/335;H01L21/336;H01L29/78 主分类号 H01L21/335
代理机构 代理人
主权项
地址