PHOTOSENSITIVE POLYMER HAVING CYCLIC BACKBONE AND RESIST COMPOSITION COMPRISING THE SAME

摘要

A RESIST COMPOSITION COMPRISING :(A) A PHOTOSENSITIVE POLYMER FOR USE IN A CHEMICALLY AMPLIFIED RESIST AND REPRESENTED BY THE FOLLOWING FORMULA(1) :WHERE R1 IS A C1 TO C20 ALIPHATIC HYDROCARBON, R2 IS SELECTED FROM THE GROUP CONSISTING OF T-BUTYL, TETRAHYDROPYRANYL AND 1-ALKOXYETHYL GROUPS 1,M, AND N ARE INTEGERS AND WHEREIN 1/(1+M+N) = 0.1~ 0.5, M/(1+M+N) = 0.1~ 0.7, AND N/(1+M+N) = 0.0~ 0.4; AND (B) A PHOTOACID GENERATOR (PAG).