发明名称 |
GAS-BARRIER STRUCTURE AND ITS MANUFACTURING PROCESS |
摘要 |
PROBLEM TO BE SOLVED: To provide a gas-barrier structure having excellent gas-barrier ability and excellent durability. SOLUTION: The invention relates to a manufacturing process of a gas-barrier structure having at least one layer of a photocurable resin layer and at least one inorganic compound layer respectively. The manufacturing process comprises a first curing step to obtain a semi-cured photocurable resin layer by irradiating the photocurable resin layer formed at least on one side of the substrate with an ultraviolet ray and a second step to further cure the semi-cured photocurable resin layer by re-irradiating the layer with an ultraviolet ray after forming an inorganic compound layer on the semi-cured photocurable resin layer by the vacuum evaporation method. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007076314(A) |
申请公布日期 |
2007.03.29 |
申请号 |
JP20050270324 |
申请日期 |
2005.09.16 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
SUZUKI TOSHIYUKI |
分类号 |
B32B9/00;C23C14/06;H01L51/50;H05B33/02;H05B33/04 |
主分类号 |
B32B9/00 |
代理机构 |
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