发明名称 Wiring structure of a semiconductor package and method of manufacturing the same, and wafer level package having the wiring structure and method of manufacturing the same
摘要 A wiring structure may include a pad, a conductive pattern and an insulating photoresist structure. The pad may be provided on a body and electrically connected to a circuit unit of the body. The conductive pattern may be provided on the body and may be electrically connected to the pad. The insulating photoresist structure may be provided on a surface of the conductive pattern. The insulating photoresist structure may have a contact hole through which the conductive pattern may be partially exposed. The insulating photoresist structure may be fabricated by providing a photosensitive photoresist film on the conductive layer, and patterning the photosensitive photoresist film by two photo processes.
申请公布号 US2007069320(A1) 申请公布日期 2007.03.29
申请号 US20060486041 申请日期 2006.07.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE IN-YOUNG;SIM SUNG-MIN;JANG DONG-HYEON;CHUNG HYUN-SOO;CHUNG JAE-SIK;RYU SEUNG-KWAN;PARK MYEONG-SOON;YOON JONG-KOOK;CHOI JU-IL
分类号 H01L31/00 主分类号 H01L31/00
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