发明名称 PLASMA PROCESSING APPARATUS, ELECTRODE MEMBER FOR PLASMA PROCESSING APPARATUS, PROCESS FOR PRODUCING ELECTRODE MEMBER AND METHOD FOR RECYCLING IT
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus in which component consumption cost is reduced by prolonging the lifetime of an electrode member composing a lower electrode and contamination on the inside of the apparatus due to adhesion of scattering matters can be prevented, and to provide an electrode member for the plasma processing apparatus, a process for producing the electrode member and a method for recycling it. <P>SOLUTION: An electrode member 46 abutting against the lower surface of a work in a plasma processing apparatus performing plasma processing of a planar work is constituted by soldering a planar adsorption member 45 having a plurality of through holes 45a and a cooling plate 44. A thermal spray film 65 is formed on the upper surface of the adsorption member 45 by thermally spraying alumina, and the edge of a hole 45d opening the through hole 45a is covered with the thermal spray film 65. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007080912(A) 申请公布日期 2007.03.29
申请号 JP20050263410 申请日期 2005.09.12
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 IWAI TETSUHIRO
分类号 H01L21/3065;H05H1/46 主分类号 H01L21/3065
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