发明名称 Projection system for EUV lithography
摘要 An EUV optical projection system includes at least six mirrors (M 1 , M 2 , M 3 , M 4 , M 5 , M 6 ) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M 2 ) and a third mirror (M 3 ), such that a first mirror (M 1 ) and the second mirror (M 2 ) form a first optical group (G 1 ) and the third mirror (M 3 ), a fourth mirror (M 4 ), a fifth mirror (M 5 ) and a sixth mirror (M 6 ) form a second optical group (G 1 ). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the first mirror (M 1 ) and the second mirror (M 2 ). The second mirror (M 2 ) is preferably convex, and the third mirror (M 3 ) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.
申请公布号 US2007070322(A1) 申请公布日期 2007.03.29
申请号 US20060604997 申请日期 2006.11.28
申请人 发明人 HUDYMA RUSSELL;MANN HANS-JURGEN;DINGER UDO
分类号 G03B27/54 主分类号 G03B27/54
代理机构 代理人
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